Kinetics of copper drift in PECVD dielectrics.

Autor: Loke, A.L.S., Changsup Ryu, Yue, C.P., Cho, J.S.H., Wong, S.S.
Zdroj: IEEE Electron Device Letters; 1996, Vol. 17 Issue 12, p549-551, 3p
Databáze: Complementary Index