Thermally assisted ion beam etching of polytetrafluoroethylene-a new technique for high aspect ratio etching of MEMS.
Autor: | Berenschot, E., Jansen, H., Burger, G.-J., Gardeniers, H., Ewenspoek, M. |
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Zdroj: | Proceedings of Ninth International Workshop on Micro Electromechanical Systems; 1996, p277-284, 8p |
Databáze: | Complementary Index |
Externí odkaz: |