Thermally assisted ion beam etching of polytetrafluoroethylene-a new technique for high aspect ratio etching of MEMS.

Autor: Berenschot, E., Jansen, H., Burger, G.-J., Gardeniers, H., Ewenspoek, M.
Zdroj: Proceedings of Ninth International Workshop on Micro Electromechanical Systems; 1996, p277-284, 8p
Databáze: Complementary Index