High Performance 0.3 μm CMOS Technology using I-Line Lithography.
| Autor: | Montree, A.H., Ansem, W. Gehoel-v., Huijten, L.H.M., Juffermans, C.A.H., de Laat, W.T.F.M., Lohmeier, M., Manders, B.S., Meijer, P.M., Paulzen, G.M., Roes, R.F.M., Webster, M.N., Zandbergen, P. |
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| Zdroj: | ESSDERC '96: Proceedings of the 26th European Solid State Device Research Conference; 1996, p597-600, 4p |
| Databáze: | Complementary Index |
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