The application of limited reaction processing to the deposition of silicon carbide layers.
| Autor: | Ruddell, F H, McNeill, D W, Armstrong, B M, Gamble, H S |
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| Zdroj: | ESSDERC '90: 20th European Solid State Device Research Conference; 1990, p357-360, 4p |
| Databáze: | Complementary Index |
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