Process Dependence of Hole Trapping in Nitrided SiO2 Films.
Autor: | Severi, M., Impronta, M., Dori, L., Guerri, S. |
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Zdroj: | ESSDERC '88: 18th European Solid State Device Research Conference; 1988, pc4-c420, 831p |
Databáze: | Complementary Index |
Externí odkaz: |