RF annealing of radiation-induced electron traps in MOS structures.
Autor: | Ma, T.P., Chin, M.R. |
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Zdroj: | 1979 International Electron Devices Meeting; 1979, p224-228, 5p |
Databáze: | Complementary Index |
Externí odkaz: |
Autor: | Ma, T.P., Chin, M.R. |
---|---|
Zdroj: | 1979 International Electron Devices Meeting; 1979, p224-228, 5p |
Databáze: | Complementary Index |
Externí odkaz: |