High density ion-implanted C-MOS technology.
| Autor: | Toombs, T.N., Finnila, R.M., Dill, H.G., Bauer, L.O. |
|---|---|
| Zdroj: | 1971 International Electron Devices Meeting; 1971, p158-158, 1p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Toombs, T.N., Finnila, R.M., Dill, H.G., Bauer, L.O. |
|---|---|
| Zdroj: | 1971 International Electron Devices Meeting; 1971, p158-158, 1p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|