Retardation of Dopant Diffusion During Fabrication and Effects Upon Junction Depth and Microelectronic Device Performance.
| Autor: | Pemsel, E. R., Lytle, W. J., Dzimianski, J. W., Skinner, S. M. |
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| Zdroj: | Third Annual Symposium on the Physics of Failure in Electronics; 1964, p404-420, 17p |
| Databáze: | Complementary Index |
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