A study of pulsed laser planarization of aluminum for VLSI metallization.
| Autor: | Liu, R., Cheung, K.P., Lai, W.Y.C., Heim, R. |
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| Zdroj: | Proceedings, Sixth International IEEE VLSI Multilevel Interconnection Conference; 1989, p329-335, 7p |
| Databáze: | Complementary Index |
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