Minimizing particle contamination in high current ion implanters.
| Autor: | Mack, K.E., Angel, G.C., Renau, A., Brown, D.A. |
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| Zdroj: | Proceedings of 11th International Conference on Ion Implantation Technology; 1996, p166-169, 4p |
| Databáze: | Complementary Index |
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