Dependence of LDD device optimization on stressing parameters at 77 K.
Autor: | Song, M., Cable, J.S., MacWilliams, K.P., Woo, J.C.S. |
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Zdroj: | International Technical Digest on Electron Devices; 1990, p223-226, 4p |
Databáze: | Complementary Index |
Externí odkaz: |