Fabrication of CMOS on ultrathin SOI obtained by epitaxial lateral overgrowth and chemical-mechanical polishing.
| Autor: | Shahidi, G., Davari, B., Taur, Y., Warnock, J., Wordeman, M.R., McFarland, P., Mader, S., Rodriguez, M., Assenza, R., Bronner, G., Ginsberg, B., Lii, T., Polcari, M., Ning, T.H. |
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| Zdroj: | International Technical Digest on Electron Devices; 1990, p587-590, 4p |
| Databáze: | Complementary Index |
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