Full copper wiring in a sub-0.25 /spl mu/m CMOS ULSI technology.
| Autor: | Edelstein, D., Heidenreich, J., Goldblatt, R., Cote, W., Uzoh, C., Lustig, N., Roper, P., McDevitt, T., Motsiff, W., Simon, A., Dukovic, J., Wachnik, R., Rathore, H., Schulz, R., Su, L., Luce, S., Slattery, J. |
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| Zdroj: | International Electron Devices Meeting IEDM Technical Digest; 1997, p773-776, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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