Suppression of reverse short channel effect by high energy implantation.
| Autor: | Chaudhrya, S., Rafferty, C.S., Nagy, W.J., Chyan, Y.F., Carroll, M.S., Chen, A.S., Lee, K.H. |
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| Zdroj: | International Electron Devices Meeting IEDM Technical Digest; 1997, p679-682, 4p |
| Databáze: | Complementary Index |
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