Degradation of deep sub-micron isolation by vacuum ultraviolet radiation from low temperature back end plasma-assisted processes.
| Autor: | Ashburn, S.P., Krishnan, S., Dixit, G.A., Rodder, M., Taylor, K., Breedijk, T., Chen, I.-C., Goodwin, M.W., Esquivel, A.L. |
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| Zdroj: | International Electron Devices Meeting IEDM Technical Digest; 1997, p449-452, 4p |
| Databáze: | Complementary Index |
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