Direct measurement of gate depletion in high breakdown (405 V) AlGaN/GaN heterostructure field effect transistors.

Autor: Vetury, R., Wu, Y.-F., Fini, P.T., Parish, G., Keller, S., DenBaars, S., Mishra, U.K.
Zdroj: International Electron Devices Meeting 1998 Technical Digest (Cat No98CH36217); 1998, p55-58, 4p
Databáze: Complementary Index