The relationship between resistance changes and void volume changes in passivated aluminum interconnects.
| Autor: | Doan, J.C., Bravman, J.C., Flinn, P.A., Marieb, T.N. |
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| Zdroj: | 1999 IEEE International Reliability Physics Symposium Proceedings 37th Annual (Cat No99CH36296); 1999, p206-212, 7p |
| Databáze: | Complementary Index |
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