Retention of mask edge integrity during MeV implants.
| Autor: | Hoglund, D.E., Parrill, T.M., Marshall, D.A., Ameen, M.S., Whiteside, D., Dahrooge, G.A., Takemura, M., Watt, V., Zhou, H.Q. |
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| Zdroj: | 1998 International Conference on Ion Implantation Technology Proceedings (Cat No98EX144); 1999, Issue 1, p525-525, 1p |
| Databáze: | Complementary Index |
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