Photosensitive benzocyclobutene for stress-buffer and passivation applications (one mask manufacturing process).
| Autor: | Strandjord, A.J.G., Rogers, W.B., Ida, Y., DeVeillis, R.R., Shiau, S., Moyer, E.S., Scheck, D.M., Garron, P.E. |
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| Zdroj: | 1997 Proceedings 47th Electronic Components & Technology Conference; 1997, p1260-1268, 9p |
| Databáze: | Complementary Index |
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