Design dependency of yield loss due to tungsten residues in spin on glass based planarization processes.
| Autor: | Simon, P.L.C., Maly, W., de Vries, D.K., Bruls, E. |
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| Zdroj: | 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No97CH36023); 1997, pP87-P90, 4p |
| Databáze: | Complementary Index |
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