Dry etching of bottom anti-reflective-coat and its application to gate length control.
| Autor: | Nishizawa, A., Tokashiki, K., Horiba, S., Miyamoto, H. |
|---|---|
| Zdroj: | 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No97CH36023); 1997, pF13-F16, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|