Dry etching of bottom anti-reflective-coat and its application to gate length control.
Autor: | Nishizawa, A., Tokashiki, K., Horiba, S., Miyamoto, H. |
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Zdroj: | 1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No97CH36023); 1997, pF13-F16, 4p |
Databáze: | Complementary Index |
Externí odkaz: |