CoSi/sub 2//SiGe contact formation by Co/a-SiGe/Si solid state reaction.
| Autor: | Qi, W.J., Li, B.Z., Jiang, G.B., Huang, W.N., Gu, Z.G. |
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| Zdroj: | 1995 IEEE TENCON IEEE Region 10 International Conference on Microelectronics & VLSI 'Asia-Pacific Microelectronics 2000' Proceedings; 1995, p278-281, 4p |
| Databáze: | Complementary Index |
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