Yield improvement for a 3.5-ns BiCMOS technology in a 200-mm manufacturing line.
| Autor: | Chen, B., Hook, T., Starkey, G., Bhattacharyya, A., Faucher, M., Racine, C., Willets, C., Eslinger, S., Kulkarni, S., King, W., Washburn, C., Piccirillo, J., Mongeon, S., Johnson, A., Gabrielle, E. |
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| Zdroj: | 1993 International Symposium on VLSI Technology, Systems & Applications Proceedings of Technical Papers; 1993, p301-305, 5p |
| Databáze: | Complementary Index |
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