Limitations of rapid thermal processing on ultra-shallow junctions for sub-0.25 mu m MOSFETs.
| Autor: | Liu, R., Pai, C.S., Lu, C.Y., Sung, J.M., Tsai, N.S. |
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| Zdroj: | 1993 International Symposium on VLSI Technology, Systems & Applications Proceedings of Technical Papers; 1993, p20-23, 4p |
| Databáze: | Complementary Index |
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