Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching.
| Autor: | Elta, M., Etemad, H., Freudenberg, J. S., Giles, M. D., Grizzle, J. W., Kabamba, P. T., Khargonekar, P. P., Lafortune, S., Meerkov, S. M., Moyne, J. R., Rashap, B. A., Teneketzis, D., Terry, F. L. |
|---|---|
| Zdroj: | 1993 American Control Conference; 1993, p2990-2997, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|