0.5 Micron Gate CMOS Technology Using E-Beam/Optical Mix Lithography.
| Autor: | Wang, L. K., Taur, Y., Moy, D., Dennard, R. H., Chiong, K., Hohn, F., Coane, P. J., Edenfeld, A., Carbaugh, S., Kenney, D., Schnur, S. |
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| Zdroj: | 1986 Symposium on VLSI Technology Digest of Technical Papers; 1986, p13-14, 2p |
| Databáze: | Complementary Index |
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