High transconductance InAlAs/InGaAs double heterostructure MESFETs with in-situ aluminum oxide gate barrier.

Autor: Chang, T.Y., Behringer, R.E., Howard, R.E., Liao, A.S.H., Jackel, L.D., Caridi, E.A., Skocpol, W.J., Epworth, R.W.
Zdroj: 1984 International Electron Devices Meeting; 1984, p356-359, 4p
Databáze: Complementary Index