Submicron CCD memory structures fabricated by electron-beam lithography.
| Autor: | Slotboom, J.W., Bartsen, J.W., Dil, J.G., Pelgrom, M.J.M., de Klerk, J.J.M.J., Verhaar, R.D.J., Juffermans, C.A.H., Vinton, D.J., Swetman, J.P. |
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| Zdroj: | 1984 International Electron Devices Meeting; 1984, p308-311, 4p |
| Databáze: | Complementary Index |
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