| Autor: |
Palasantzas, G., Backx, G. M. E. A. |
| Předmět: |
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| Zdroj: |
Journal of Chemical Physics; 3/8/2003, Vol. 118 Issue 10, p4631, 5p, 7 Graphs |
| Abstrakt: |
In this paper we investigate the influence of self-affine roughness on the charge density and capacitance of electrical double layers within the nonlinear regime. The roughness influence is significant for small roughness exponents (H<0.5) and/or large long wavelength roughness ratios w/ξ, as well as small Debye lengths λD (<ξ). With increasing electrode voltage, the apparent charge density increases fast in an exponential manner for relatively high voltages. On the other hand, the charge capacitance increases up to a maximum after which it approaches an asymptotic value, which is determined by the roughness ratio of the actual to apparent flat interface area. The roughness influence is amplified within the nonlinear regime if the interface becomes rougher at any lateral roughness wavelength (smaller exponent H and/or larger ratio w/ξ). Finally, the total charge capacitance, which is obtained by considering the contribution from the thin Helmholtz layer, is also shown to be highly sensitive to interface roughness details within the nonlinear regime. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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