AES and XPS studies of surface films deposited during the plasma etching of silicon dioxide layers.
| Autor: | Tuppen, C. G., Heckingbottom, R., Gill, M., Heslop, C., Davies, G. J. |
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| Zdroj: | Surface & Interface Analysis: SIA; 1984, Vol. 6 Issue 6, p267-273, 7p |
| Databáze: | Complementary Index |
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