Micropatterning of polymethacrylates by single- or two-photon irradiation using π-conjugated o-nitrobenzyl ester phototrigger as side chains.

Autor: Jin, Ming, Xu, Haoran, Hong, Hong, Bao, Chunyan, Pu, Hongting, Wan, Decheng, Zhu, Linyong
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Zdroj: Journal of Applied Polymer Science; Dec2013, Vol. 130 Issue 6, p4099-4106, 9p
Abstrakt: ABSTRACT A new single-/two-photon sensitive monomer, ( E)-5-(4-ethoxystyryl)−2-nitrobenzyl methacrylate (ENbMA), was synthesized and copolymerized with methyl methacrylate (MMA) to form a series of photosensitive copolymers P(ENbMA-MMA)s that were well characterized by 1H NMR and GPC. The photochemical and photophysical properties of both photosensitive monomer and copolymers upon visible light irradiation were studied by UV-Vis, FTIR, and HPLC spectra, which confirmed that 5-(4-ethoxystyryl)-2-nitrobenzyl ester can be photolyzed effectively with generation of the corresponding 5-(4-ethoxystyryl)-2-nitrosobenzaldehyde and carboxylic acid groups. The successful photocleavage endowed the optimized copolymers with excellent micropatterning property due to the effective generation of alkaline-soluble carboxylic acid groups. Moreover, the high two-photon absorption cross-sections (over 20 GM at 800 nm) and the comparable photolysis upon two-photon NIR light irradiation of the chromophores provided the copolymers with significant application in two-photon microfabrication. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 130: 4099-4106, 2013 [ABSTRACT FROM AUTHOR]
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