Impact of wafer thinning on High-K Metal Gate 20nm devices.
| Autor: | Beece, Adam, Agarwal, Rahul, Chandrashekhar, Sandhya, Singh, Jagar, Siddhartha, Alapati, Ramakanth, Parameshwaran, Biju, Dumas, Jeff, Alvanos, Tyson |
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| Zdroj: | 2013 IEEE 63rd Electronic Components & Technology Conference; 2013, p1892-1897, 6p |
| Databáze: | Complementary Index |
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