The stress-induced escape of migrating aluminium from silicide interconnects.
Autor: | Zehe, A |
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Zdroj: | Semiconductor Science & Technology; 2001, Vol. 16 Issue 10, p817-821, 5p |
Databáze: | Complementary Index |
Externí odkaz: |
Autor: | Zehe, A |
---|---|
Zdroj: | Semiconductor Science & Technology; 2001, Vol. 16 Issue 10, p817-821, 5p |
Databáze: | Complementary Index |
Externí odkaz: |