EUV discharge light source based on a dense plasma focus operated with positive and negative polarity.

Autor: Fomenkov, I V, Böwering, N, Rettig, C L, Melnychuk, S T, Oliver, I R, Hoffman, J R, Khodykin, O V, Ness, R M, Partlo, W N
Zdroj: Journal of Physics D: Applied Physics; 12/ 7/2004, Vol. 37 Issue 23, p3266-3276, 11p
Abstrakt: The application of a dense plasma focus pinch discharge as a light source for extreme ultraviolet (EUV) lithography is discussed. For operation with xenon gas, the radiation emitted at around 13.5 nm is analysed with temporal, spectral or spatial resolution. We describe and compare the operating characteristics and plasma dynamics of the device when energized at positive and negative polarity of the charging voltage. The thermal load distribution, heat deposition and wear of the electrodes are measured and compared for both configurations. High-repetition rate burst mode data show characteristic transients. Source size data are also obtained when tin powder is used as the target element. More favourable performance characteristics were generally obtained for operation of the pinch discharge at negative polarity. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index