Plasma Enhanced Metal-Organic Chemical Vapor Deposition of Germanium Nitride Thin Films.

Autor: Hoffman, David M., Rangarajan, Sri Prakash, Athavale, Satish D., Economou, Demetre J., Liu, Jia-Rui, Zheng, Zongshuang, Chu, Wei-Kan
Zdroj: MRS Online Proceedings Library; 02/06/1993, Vol. 335, pN.PAG-1, 1p
Databáze: Complementary Index