High Dose Rate Oxygen Implantation for Formation of Silicon-on-Insulator Structures.
Autor: | Cortesi, E., Namavar, F., Pinizzotto, R. F., Yang, H. |
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Zdroj: | MRS Online Proceedings Library; 01/22/1990, Vol. 201, pN.PAG-1, 1p |
Databáze: | Complementary Index |
Externí odkaz: |