High Dose Rate Oxygen Implantation for Formation of Silicon-on-Insulator Structures.

Autor:	Cortesi, E., Namavar, F., Pinizzotto, R. F., Yang, H.
Zdroj:	MRS Online Proceedings Library; 01/22/1990, Vol. 201, pN.PAG-1, 1p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink