Effect of Oxygen Implantation Conditions on Buried Si02 Layer Formation using a Multiple Step Process.
| Autor: | Namavar, F., Cortesi, E., Pinizzotto, R.F., Yang, H. |
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| Zdroj: | MRS Online Proceedings Library; 01/19/1989, Vol. 157, pN.PAG-1, 1p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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