Degradation of TiSi2/n+-Polysilicon Interfaces Due to High Temperature Processing.

Autor:	Shenai, K., Piacente, P. A., Smith, G. A., Lewis, N., Mcconnell, M. D., Norton, J. F., Hall, E. L., Baliga, B. J.
Zdroj:	MRS Online Proceedings Library; 01/07/1988, Vol. 106, pN.PAG-1, 1p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink