Rutherford Backscattering (RBS) and Channeling Studies of Defects in Arsenic Implanted Silicon Induced by Arsenic Clustering.
| Autor: | Baiocchi, Frank A., Kamgar, Avid |
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| Zdroj: | MRS Online Proceedings Library; 01/16/1986, Vol. 82, pN.PAG-1, 1p |
| Databáze: | Complementary Index |
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