Short Time annealing of As and B Ion Implanted Si using Tungsten-Halogen Lamps.

Autor: Sedgwick, T. O., Kalish, R., Mader, S. R., Shatas, S. C.
Zdroj: MRS Online Proceedings Library; 01/11/1983, Vol. 23, pN.PAG-1, 1p
Databáze: Complementary Index