Deposition of epitaxial β–SiC films on porous Si(100) from MTS in a hot wall LPCVD reactor.

Autor: Chiu, Chien C., Desu, Seshu B., Chen, Gang, Tsai, Ching Yi, Reynolds, William T.
Zdroj: Journal of Materials Research; 05/01/1995, Vol. 10 Issue 5, p1099-1107, 9p
Databáze: Complementary Index
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