Growth kinetics and characterizations of gallium nitride thin films by remote PECVD.

Autor:	Choi, S.W., Bachmann, K.J., Lucovsky, G.
Zdroj:	Journal of Materials Research; 04/01/1993, Vol. 8 Issue 4, p847-854, 8p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu Full text from SpringerLink