The diffusion of hydrogen in silicon and mechanisms for “unintentional” hydrogenation during ion beam processing.
| Autor: | Seager, C. H., Anderson, R. A., Panitz, J. K. G. |
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| Zdroj: | Journal of Materials Research; 02/01/1987, Vol. 2 Issue 1, p96-106, 11p |
| Databáze: | Complementary Index |
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