| Autor: |
Schulz, C., Styrnoll, T., Lapke, M., Oberrath, J., Storch, R., Awakowicz, P., Brinkmann, R. P., Musch, T., Mussenbrock, T., Rolfes, I. |
| Zdroj: |
2012 International Conference on Electromagnetics in Advanced Applications; 1/ 1/2012, p728-731, 4p |
| Abstrakt: |
This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes. [ABSTRACT FROM PUBLISHER] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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