| Autor: |
Kuo, Jonathan T. W., Meng, Ellis |
| Zdroj: |
2012 IEEE 25th International Conference on Micro Electro Mechanical Systems (MEMS); 1/ 1/2012, p263-266, 4p |
| Abstrakt: |
We report an improved process for backside inclined lithography. The specific improvement is the combination of backside inclined exposure and glycerol medium index matching with a Parylene adhesion layer. This method allows for high aspect ratio SU-8 inclined structures with large surface contact areas on soda lime substrates for optical applications in optogenetic studies. Improved yields over the entire wafer were achieved with improved SU-8 substrate adhesion and perfect gapless contact between the masked substrate and SU-8. The surface roughness of the SU-8 structures is less than 8 nanometers, smooth enough for use as mirrors. [ABSTRACT FROM PUBLISHER] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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