| Autor: |
Haringer, Daniel, Chen, Gang, Jakobs, Peter, Yarema, Maksym, Heiss, Wolfgang, Kohl, Manfred |
| Zdroj: |
2012 12th IEEE International Conference on Nanotechnology (IEEE-NANO); 1/ 1/2012, p1-4, 4p |
| Abstrakt: |
Nanoparticle positioning by a silicon pore array template with decreasing pore diameter down to 16 nm opens up a new way of fabrication of metal nanostructures based on high precision dry etching of silicon. We demonstrate how this process can be used to fabricate plasmonic nano-structures. Plasmonic dipole structures are presented with variable gap size below 20 nm. [ABSTRACT FROM PUBLISHER] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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