Moderate-dose proton implantation through double-barrier structures.

Autor:	Billen, K., Kelly, M.J., Gwilliam, R.M., Wilson, R.J., Henini, M.
Zdroj:	Electronics Letters (Institution of Engineering & Technology); 01/18/1996, Vol. 32 Issue 2, p140-141, 2p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu