Complex investigations of effects of charging a polymer resist (PMMA) during electron lithography.

Autor:	Rau, E., Evstaf'eva, E., Zaitsev, S., Knyazev, M., Svintsov, A., Tatarintsev, A.
Předmět:	POLYMETHYLMETHACRYLATE DIELECTRICS NANOLITHOGRAPHY ELECTRON beams BREAKDOWN voltage
Zdroj:	Russian Microelectronics; Mar2013, Vol. 42 Issue 2, p89-98, 10p
Abstrakt:	Results of the measurement of the surface charging potential for PMMA films of various thicknesses under the effect of irradiation by electron beams of various energies are presented. The corresponding energy ranges of primary electrons are given for the cases of both positive and negative charging of the dielectrics. It is shown that two individual critical electron energies exist for each thickness of the PMMA resist, at which the resist is not charged. These energies can be recommended for low-voltage and high-voltage electron nanolithography with minimal errors in beam positioning. The experiments showed a very high value of the critical breakdown voltage of the PMMA film of about 10 V/cm. [ABSTRACT FROM AUTHOR]
Databáze:	Complementary Index
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