Future electron-beam lithography and implications on design and CAD tools.
Autor: | Chen, Jack J. H., Krecinic, Faruk, Chen, Jen-Hom, Chen, Raymond P. S., Lin, Burn J. |
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Zdroj: | Proceedings of the 16th Asia & South Pacific Design Automation Conference; 1/25/2011, p403-404, 2p |
Databáze: | Complementary Index |
Externí odkaz: |