Etching techniques for the realization of semiconductor devices based on III-V nitrides.
| Autor: | Huey-Liang Wang, Jyh-Tsung Hsieh, Pilkuhn, M. |
|---|---|
| Zdroj: | Proceedings 2001 IEEE Hong Kong Electron Devices Meeting (Cat. No.01TH8553); 2001, p2-3, 2p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|